Plasma Chemistry and Plasma Processing

#777
Год: 1981-2012
Жанр: Химия
Издательство: Springer
ISSN: 0272-4324 (Print), 1572-8986 (Online)
Язык: Английский
Формат: PDF
Качество: Отсканированные страницы + OCR / Изначально компьютерное (eBook)
Интерактивное оглавление: Нет
Описание: Журнал публикует работы, посвященные фундаментальным и прикладным аспектам химии плазмы.

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An international forum for fundamental research and new developments in plasma chemistry and plasma processing
Offers fundamental plasma studies and studies of specific applications
Covers plasma etching in microelectronics, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and more

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.




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За журнал спасибо Frol333 и камрадам с кемпорта